The use of finFETs and multi-patterning has a huge impact on the entire physical implementation flow. This paper outlines the new challenges in placement, routing, optimization, and physical ...

At this week's VLSI 2015 Symposium in Kyoto (Japan), imec reported new results on nanowire FETs and quantum-well FinFETs towards post-FinFET multi-gate device solutions. As the major portion of the ...

The semiconductor industry faces a major change in the way that ICs are made in order to keep improving performance and density, a change that has potential ramifications for design methodologies.

FinFET transistors are now in production at the major foundries, having gone from drawing board to products on the shelf in record time. FinFET adoption has been growing steadily because they deliver ...

At Intel’s recent Technology and Manufacturing Day, Intel presented more details regarding its 10nm FinFET manufacturing process. In the presentation materials, Intel highlighted some of the major ...

In Proc. 2020 IEEE Symposium on VLSI Technology (in the press); https://go.nature.com/38FQLhw To scale electronics beyond the 5 nm technology node, advances in ...

The demand for smartphones and tablets with better performance and longer battery life has been driving the industry to come up with chips that are faster, smaller and use less power. To remain on ...

According to a recent announcement, Samsung has begun mass production of the industry’s first 10nm FinFET SoCs further solidifying Samsung’s position as one of the world’s most advanced chipmakers.

The use of finFETs and multi-patterning has a huge impact on the entire physical implementation flow. This paper outlines the new challenges in placement, routing, optimization, and physical ...