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Abstract: Improving the bowing profile and LCDU in HAR etching is challenging due to ion sputtering, insufficient sidewall protection, and uneven polymer deposition. To address these challenges, we ...
Abstract: Research results of ion - initiated etching processes of polymer films based on polyimide in oxygen plasma, sulfur hexafluoride and oxygen-argon mixtures of low pressure (around 10-12 Pa) ...
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